AUCKLAND: New Zealand designer Juliette Hogan has been singled out for special attention in a prestigious New York-based awards program.
The Auckland-based designer was named as one of only five finalists in the 11th annual Gen Art Styles International Design competition women's ready-to-wear category.
Attracting more than 800 entrants from around the world, the awards are judged by a stellar panel which this year included buyers and editors from Vogue, Teen Vogue, Elle, WWD, Barney's and Neiman Marcus.
Her success means Hogan and the other finalists will fly to New York in July where they will present their looks to a second panel with the winner taking home a cash prize of $5000.
The awards finals marks the second time in recent years Hogan has been flown to New York after she completed a senior year at Parsons School of Design after taking out the Karen Walker Steinlager ‘dare to be’ scholarship in the early 2000's.
Hogan, who is represented in New Zealand by Showroom 22, operates a flagship store in Auckland's Ponsonby and is an annual fixture at Air New Zealand Fashion Week.